Macro Precision Technology Co., Ltd

We provide professional thin film Novellus series machines to assist customers in purchasing or repairing used equipment that meets their needs.

chemical vapor deposition，簡稱CVD，是一種用來產生純度高、效能好的固態材料的化學技術，使用此技術來成長薄膜。

Implantation is a low temperature process that accelerates ions of an element into a solid target, thereby changing the physical, chemical or electrical properties of the target. Ion implantation is used in semiconductor device fabrication and metal finishing.

Thinning is the most direct and effective process improvement for reducing power semiconductor power dissipation and input impedance. This step not only reduces package size, but also extends wafer lifetime by reducing RDS and heat build-up.

Etching is an important process in the manufacture of microelectronic components. Before each substrate is completed, it goes through an etching process. During the etching process, the material can be made more resistant because it protects the substrate from damage by etching agents.

Etching is an important process in the manufacture of microelectronic components. Before each substrate is completed, it goes through an etching process. During the etching process, the material can be made more resistant because it protects the substrate from damage by etching agents.

According to customer needs, we provide solutions, supporting the most suitable machine for customers.